12. Chemical Stability of Organic Monolayers Formed in Solution

  1. Franklin (Feng) Tao2 and
  2. Steven L. Bernasek3
  1. Leslie E. O'leary,
  2. Erik Johansson and
  3. Nathan S. Lewis

Published Online: 20 MAR 2012

DOI: 10.1002/9781118199770.ch12

Functionalization of Semiconductor Surfaces

Functionalization of Semiconductor Surfaces

How to Cite

O'leary, L. E., Johansson, E. and Lewis, N. S. (2012) Chemical Stability of Organic Monolayers Formed in Solution, in Functionalization of Semiconductor Surfaces (eds F. (. Tao and S. L. Bernasek), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118199770.ch12

Editor Information

  1. 2

    Department of Chemistry and Biochemistry, University of Notre Dame, Notre Dame, IN, USA

  2. 3

    Department of Chemistry, Princeton University, Princeton, NJ, USA

Author Information

  1. Department of Chemistry, California Institute of Technology, Pasadena, CA, USA

Publication History

  1. Published Online: 20 MAR 2012
  2. Published Print: 16 MAR 2012

ISBN Information

Print ISBN: 9780470562949

Online ISBN: 9781118199770

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Keywords:

  • organic monolayer in solution, and chemical stability;
  • H-terminated silicon surface reactivity;
  • halogen-, carbon-terminated silicon surface reactivity;
  • functionalized silicon surface, applications and strategies;
  • kinetic stability of Si–C and physical barrier imposed

Summary

This chapter contains sections titled:

  • Reactivity of H-Terminated Silicon Surfaces

  • Reactivity of Halogen-Terminated Silicon Surfaces

  • Carbon-Terminated Silicon Surfaces

  • Applications and Strategies for Functionalized Silicon Surfaces

  • Conclusions

  • References