2. Surface Analytical Techniques

  1. Franklin (Feng) Tao2 and
  2. Steven L. Bernasek3
  1. Ying Wei Cai1,3 and
  2. Steven L. Bernasek3

Published Online: 20 MAR 2012

DOI: 10.1002/9781118199770.ch2

Functionalization of Semiconductor Surfaces

Functionalization of Semiconductor Surfaces

How to Cite

Cai, Y. W. and Bernasek, S. L. (2012) Surface Analytical Techniques, in Functionalization of Semiconductor Surfaces (eds F. (. Tao and S. L. Bernasek), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118199770.ch2

Editor Information

  1. 2

    Department of Chemistry and Biochemistry, University of Notre Dame, Notre Dame, IN, USA

  2. 3

    Department of Chemistry, Princeton University, Princeton, NJ, USA

Author Information

  1. 1

    Befar Chemical Group Co., Ltd, Binzhou, Shandong, China

  2. 3

    Department of Chemistry, Princeton University, Princeton, NJ, USA

Publication History

  1. Published Online: 20 MAR 2012
  2. Published Print: 16 MAR 2012

ISBN Information

Print ISBN: 9780470562949

Online ISBN: 9781118199770

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Keywords:

  • surface analytical techniques, and scientific understanding;
  • semiconductor surface, for modification, functionalization;
  • LEED pattern, symmetry monitor, and diffraction spot intensities;
  • surface composition, structure, and vibrational analysis;
  • semiconductor surface reaction, kinetic and energetic

Summary

This chapter contains sections titled:

  • Introduction

  • Surface Structure

  • Surface Composition, Electronic Structure, and Vibrational Properties

  • Kinetic and Energetic Probes

  • Conclusions

  • References