Structural and Optical Properties of Silicon Carbonitride Thin Films Deposited by Reactive DC Magnetron Sputtering

  1. TMS
  1. Okan Agirseven1,
  2. Tolga Tavsanoglu1,
  3. Esra Ozkan Zayim2 and
  4. Onuralp YUCEL1

Published Online: 18 MAY 2012

DOI: 10.1002/9781118356074.ch76

Supplemental Proceedings: Materials Processing and Interfaces, Volume 1

Supplemental Proceedings: Materials Processing and Interfaces, Volume 1

How to Cite

Agirseven, O., Tavsanoglu, T., Zayim, E. O. and YUCEL, O. (2012) Structural and Optical Properties of Silicon Carbonitride Thin Films Deposited by Reactive DC Magnetron Sputtering, in Supplemental Proceedings: Materials Processing and Interfaces, Volume 1 (ed TMS), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118356074.ch76

Author Information

  1. 1

    Istanbul Technical University, Metallurgical and Materials Engineering Department, 34469, Maslak, Istanbul, Turkey

  2. 2

    Istanbul Technical University, Faculty of Science and Letters, Engineering Physics, Department, 34469, Maslak, Istanbul, Turkey

Publication History

  1. Published Online: 18 MAY 2012
  2. Published Print: 17 MAR 2012

ISBN Information

Print ISBN: 9781118296073

Online ISBN: 9781118356074

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Keywords:

  • silicon carbonitride;
  • thin film;
  • reactive magnetron sputtering;
  • microstructure;
  • band gap;
  • optical constants

Summary

This chapter contains sections titled:

  • Introduction

  • Experimental

  • Results and Discussion

  • Conclusions

  • Acknowledgments