Organic Thermal Mode Photoresists for Applications in Nano-Lithography

  1. TMS
  1. Hsiu-Wen Wu1,
  2. Ming Chia Li2,
  3. Chin-Tien Yang3,
  4. Chung-Ta Cheng2,
  5. Shuen-Chen Chen2 and
  6. Der-Ray Huang1

Published Online: 18 MAY 2012

DOI: 10.1002/9781118356074.ch84

Supplemental Proceedings: Materials Processing and Interfaces, Volume 1

Supplemental Proceedings: Materials Processing and Interfaces, Volume 1

How to Cite

Wu, H.-W., Li, M. C., Yang, C.-T., Cheng, C.-T., Chen, S.-C. and Huang, D.-R. (2012) Organic Thermal Mode Photoresists for Applications in Nano-Lithography, in Supplemental Proceedings: Materials Processing and Interfaces, Volume 1 (ed TMS), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118356074.ch84

Author Information

  1. 1

    Dept. of Opto-Electronics, National Dong Hwa University, Hualien 970, Taiwan

  2. 2

    Electronics and Optoelectronics Research Laboratories, ITRI, Hsinchu 310, Taiwan

  3. 3

    Nanotechnology Research center, ITRI, Hsinchu 310, Taiwan

Publication History

  1. Published Online: 18 MAY 2012
  2. Published Print: 17 MAR 2012

ISBN Information

Print ISBN: 9781118296073

Online ISBN: 9781118356074

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Keywords:

  • Thermal photoresists;
  • Submicron pattern;
  • nano-lithography

Summary

This chapter contains sections titled:

  • Introduction

  • Experimental Details

  • Results and Discussion

  • Conclusions

  • Acknowledgments