Raman Spectroscopy of Graphene and Plasma Treated Graphene under High Pressure

  1. TMS
  1. Ali Hadjikhani,
  2. J. Chen,
  3. S. Das and
  4. W. Choi

Published Online: 7 JUN 2012

DOI: 10.1002/9781118357002.ch10

Supplemental Proceedings: Materials Properties, Characterization, and Modeling, Volume 2

Supplemental Proceedings: Materials Properties, Characterization, and Modeling, Volume 2

How to Cite

Hadjikhani, A., Chen, J., Das, S. and Choi, W. (2012) Raman Spectroscopy of Graphene and Plasma Treated Graphene under High Pressure, in Supplemental Proceedings: Materials Properties, Characterization, and Modeling, Volume 2 (ed TMS), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118357002.ch10

Author Information

  1. FIU(Florida International University)11200 SW, 8th Street Bldg. VH, Rm. 140; Miami, Florida, 33199, USA

Publication History

  1. Published Online: 7 JUN 2012
  2. Published Print: 17 MAR 2012

ISBN Information

Print ISBN: 9781118296097

Online ISBN: 9781118357002

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Keywords:

  • Graphene;
  • High Pressure;
  • Raman;
  • Plasma Treatment

Summary

This chapter contains sections titled:

  • Introduction

  • Experiment