RTS Noise Analysis in Fin-type Silicon-Oxide-High-k-Oxide-Silicon Flash Memory
Published Online: 7 JUN 2012
Copyright © 2012 The Minerals, Metals, & Materials Society. All rights reserved.
Supplemental Proceedings: Materials Properties, Characterization, and Modeling, Volume 2
How to Cite
Yang, S. D., Jeong, K. S., Yun, H. J., Kim, Y. M., Lee, S. Y., Kwon, S. K., Oh, J. s., Lee, H. D. and Lee, G. W. (2012) RTS Noise Analysis in Fin-type Silicon-Oxide-High-k-Oxide-Silicon Flash Memory, in Supplemental Proceedings: Materials Properties, Characterization, and Modeling, Volume 2 (ed TMS), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118357002.ch11
- Published Online: 7 JUN 2012
- Published Print: 17 MAR 2012
Print ISBN: 9781118296097
Online ISBN: 9781118357002
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