Chemical-Solution Deposition of Hafnia Films on Self-Assembled Molecular Monolayers: Part I - Film Characterization

  1. Richard M. Laine,
  2. Michael Hu and
  3. Songwei Lu
  1. Michael Z. Hu1,
  2. Gerold E. Jellison1,
  3. Amy C. DeBaillie2 and
  4. Yayi Wei3

Published Online: 25 APR 2012

DOI: 10.1002/9781118408049.ch5

Ceramic Nanomaterials and Nanotechnologies IV, Volume 172

Ceramic Nanomaterials and Nanotechnologies IV, Volume 172

How to Cite

Hu, M. Z., Jellison, G. E., DeBaillie, A. C. and Wei, Y. (2006) Chemical-Solution Deposition of Hafnia Films on Self-Assembled Molecular Monolayers: Part I - Film Characterization, in Ceramic Nanomaterials and Nanotechnologies IV, Volume 172 (eds R. M. Laine, M. Hu and S. Lu), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118408049.ch5

Author Information

  1. 1

    Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6181.

  2. 2

    Current address: University of North Carolina at Chapel Hill, Chapel Hill, NC 27599.

  3. 3

    Current address: Infineon Technologies, Hopewell Junction, NY 12533

Publication History

  1. Published Online: 25 APR 2012
  2. Published Print: 1 MAR 2006

ISBN Information

Print ISBN: 9781574982428

Online ISBN: 9781118408049

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Keywords:

  • chemical-solution deposition;
  • self-assembled molecular monolayers;
  • hafnia precursor films;
  • heat-induced hydrolysis;
  • hydrochloric acid

Summary

This chapter contains sections titled:

  • Introduction

  • Experimental Methods

  • Results

  • Discussion

  • Conclusions

  • Acknowledgments