Optimized Sputtering Parameters for ITO Thin Films of High Conductivity and Transparency

  1. K. M. Nair and
  2. Shashank Priya
  1. Jihoon Jung and
  2. Ruyan Guo

Published Online: 7 NOV 2012

DOI: 10.1002/9781118511350.ch5

Advances and Applications in Electroceramics II: Ceramic Transactions, Volume 235

Advances and Applications in Electroceramics II: Ceramic Transactions, Volume 235

How to Cite

Jung, J. and Guo, R. (2012) Optimized Sputtering Parameters for ITO Thin Films of High Conductivity and Transparency, in Advances and Applications in Electroceramics II: Ceramic Transactions, Volume 235 (eds K. M. Nair and S. Priya), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118511350.ch5

Author Information

Publication History

  1. Published Online: 7 NOV 2012
  2. Published Print: 15 OCT 2012

ISBN Information

Print ISBN: 9781118273357

Online ISBN: 9781118511350

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Keywords:

  • optimized sputtering;
  • thin films;
  • transparent conducting oxides;
  • probe conductivity measurement;
  • electrical conduction

Summary

This chapter contains sections titled:

  • Introduction

  • Experimental Details

  • Results and Discussions

  • Conclusion

  • Acknowledgement