Effect of Nanocrystalline Diamond Deposition Conditions on Si MOSFET Device Characteristics

  1. K. M. Nair and
  2. Shashank Priya
  1. N. Govindaraju1,
  2. P. B. Kosel2 and
  3. R.N. Singh1

Published Online: 7 NOV 2012

DOI: 10.1002/9781118511350.ch9

Advances and Applications in Electroceramics II: Ceramic Transactions, Volume 235

Advances and Applications in Electroceramics II: Ceramic Transactions, Volume 235

How to Cite

Govindaraju, N., Kosel, P. B. and Singh, R.N. (2012) Effect of Nanocrystalline Diamond Deposition Conditions on Si MOSFET Device Characteristics, in Advances and Applications in Electroceramics II: Ceramic Transactions, Volume 235 (eds K. M. Nair and S. Priya), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118511350.ch9

Author Information

  1. 1

    Energy and Materials Engineering, University of Cincinnati, Cincinnati, OH 45221-0070

  2. 2

    Electrical and Computer Engineering, University of Cincinnati, Cincinnati, OH 45221-0030

Publication History

  1. Published Online: 7 NOV 2012
  2. Published Print: 15 OCT 2012

ISBN Information

Print ISBN: 9781118273357

Online ISBN: 9781118511350

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