Preparation of Epitaxially Grown Cr-Si-N Thin Films by Pulsed Laser Deposition

  1. Hua-Tay Lin,
  2. Taejin Hwang,
  3. Soshu Kirihara and
  4. Sujanto Widjaja
  1. T. Endo,
  2. K. Suzuki,
  3. A. Sato,
  4. T. Suzuki,
  5. T. Nakayama,
  6. H. Suematsu and
  7. K. Niihara

Published Online: 22 NOV 2013

DOI: 10.1002/9781118807651.ch7

Advanced Ceramic Coatings and Materials for Extreme Environments III

Advanced Ceramic Coatings and Materials for Extreme Environments III

How to Cite

Endo, T., Suzuki, K., Sato, A., Suzuki, T., Nakayama, T., Suematsu, H. and Niihara, K. (2013) Preparation of Epitaxially Grown Cr-Si-N Thin Films by Pulsed Laser Deposition, in Advanced Ceramic Coatings and Materials for Extreme Environments III (eds H.-T. Lin, T. Hwang, S. Kirihara and S. Widjaja), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118807651.ch7

Publication History

  1. Published Online: 22 NOV 2013
  2. Published Print: 21 OCT 2013

ISBN Information

Print ISBN: 9781118807552

Online ISBN: 9781118807651

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Keywords:

  • thin films;
  • pulsed laser deposition;
  • nitrogen plasma;
  • X-ray diffraction;
  • electron energy loss spectroscopy

Summary

This chapter contains sections titled:

  • Introduction

  • Experimental

  • Results and Discussion

  • Acknowledgement