Influence of Oxygen Content on the Hardness and Electrical Resistivity of Cr(N,O) Thin Films

  1. Hua-Tay Lin,
  2. Taejin Hwang,
  3. Soshu Kirihara and
  4. Sujanto Widjaja
  1. Aoi Sato,
  2. Toshiyuki Endo,
  3. Kazuma Suzuki,
  4. Tsuneo Suzuki,
  5. Tadachika Nakayama,
  6. Hisayuki Suematsu and
  7. Koichi Niihara

Published Online: 22 NOV 2013

DOI: 10.1002/9781118807651.ch8

Advanced Ceramic Coatings and Materials for Extreme Environments III

Advanced Ceramic Coatings and Materials for Extreme Environments III

How to Cite

Sato, A., Endo, T., Suzuki, K., Suzuki, T., Nakayama, T., Suematsu, H. and Niihara, K. (2013) Influence of Oxygen Content on the Hardness and Electrical Resistivity of Cr(N,O) Thin Films, in Advanced Ceramic Coatings and Materials for Extreme Environments III (eds H.-T. Lin, T. Hwang, S. Kirihara and S. Widjaja), John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118807651.ch8

Publication History

  1. Published Online: 22 NOV 2013
  2. Published Print: 21 OCT 2013

ISBN Information

Print ISBN: 9781118807552

Online ISBN: 9781118807651

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Keywords:

  • chromium oxynitride;
  • thin films;
  • oxygen content;
  • Rutherford backscattering spectroscopy;
  • electron energy loss spectroscopy

Summary

This chapter contains sections titled:

  • Introduction

  • Experimental

  • Results and Discussion

  • Conclusion

  • Acknowledgement