9. Block Copolymer Nanopatterns as Enabling Platforms for Device Applications—Status, Issues, and Challenges
Published Online: 13 JUN 2014
Copyright © 2014 John Wiley & Sons, Inc.
Synthesis and Applications of Copolymers
How to Cite
Parthiban, A. (2014) Block Copolymer Nanopatterns as Enabling Platforms for Device Applications—Status, Issues, and Challenges, in Synthesis and Applications of Copolymers, John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118860168.ch9
- Published Online: 13 JUN 2014
- Published Print: 23 JUN 2014
Print ISBN: 9781118057469
Online ISBN: 9781118860168
- Block copolymers;
- microphase separation;
- polymeric micelles;
Nanoscale structures and patterns with tailorable geometries are widely sought after as means of introducing new properties and enhancing performance of devices and interfaces. Their exploitation in real-life technologies additionally demand that their processing adequately meet the requirements of economy, scalability and throughput. Self-Assembly of block copolymers offers unique solutions in this respect, as it delivers nanoscale patterning at high feature and spatial resolutions along with several key qualities that favorably disposes it toward meeting the stringent manufacturing and quality assurance specifications desired by technologies. This chapter would review the state of the art, emphasizing the opportunities and challenges in exploitation of block copolymers for device applications. Specific instances of the use of block copolymer derived nanopatterns to meet the demands of microelectronic, optical, sensor and filtration devices are reviewed.