9. Block Copolymer Nanopatterns as Enabling Platforms for Device Applications—Status, Issues, and Challenges

  1. Anbanandam Parthiban
  1. Sivashankar Krishnamoorthy

Published Online: 13 JUN 2014

DOI: 10.1002/9781118860168.ch9

Synthesis and Applications of Copolymers

Synthesis and Applications of Copolymers

How to Cite

Parthiban, A. (2014) Block Copolymer Nanopatterns as Enabling Platforms for Device Applications—Status, Issues, and Challenges, in Synthesis and Applications of Copolymers, John Wiley & Sons, Inc., Hoboken, NJ, USA. doi: 10.1002/9781118860168.ch9

Author Information

  1. Institute of Chemical and Engineering Sciences, Agency for Science, Technology and Research, Singapore

Publication History

  1. Published Online: 13 JUN 2014
  2. Published Print: 23 JUN 2014

ISBN Information

Print ISBN: 9781118057469

Online ISBN: 9781118860168

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Keywords:

  • Block copolymers;
  • self-assembly;
  • microphase separation;
  • polymeric micelles;
  • nanopatterns;
  • nanoarrays;
  • nanostructure

Summary

Nanoscale structures and patterns with tailorable geometries are widely sought after as means of introducing new properties and enhancing performance of devices and interfaces. Their exploitation in real-life technologies additionally demand that their processing adequately meet the requirements of economy, scalability and throughput. Self-Assembly of block copolymers offers unique solutions in this respect, as it delivers nanoscale patterning at high feature and spatial resolutions along with several key qualities that favorably disposes it toward meeting the stringent manufacturing and quality assurance specifications desired by technologies. This chapter would review the state of the art, emphasizing the opportunities and challenges in exploitation of block copolymers for device applications. Specific instances of the use of block copolymer derived nanopatterns to meet the demands of microelectronic, optical, sensor and filtration devices are reviewed.