Chapter 3. Silicon Device Processing

  1. Prof. Kenneth A. Jackson
  1. Dim-Lee Kwong

Published Online: 21 DEC 2007

DOI: 10.1002/9783527611805.ch3

Silicon Devices: Structures and Processing

Silicon Devices: Structures and Processing

How to Cite

Kwong, D.-L. (1998) Silicon Device Processing, in Silicon Devices: Structures and Processing (ed K. A. Jackson), Wiley-VCH Verlag GmbH, Weinheim, Germany. doi: 10.1002/9783527611805.ch3

Editor Information

  1. The University of Arizona, Arizona Materials Laboratory, 4715 E., Fort Lowell Road, Tucson, AZ 85712, USA

Author Information

  1. Microelectronics Research Center, Department of Electrical and Computer Engineering. The University of Texas at Austin, Austin, TX, U.S.A.

Publication History

  1. Published Online: 21 DEC 2007
  2. Published Print: 15 OCT 1998

ISBN Information

Print ISBN: 9783527295951

Online ISBN: 9783527611805

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Keywords:

  • ion implantation;
  • silicon-on-insulator;
  • gate electrodes;
  • intrinsic gettering;
  • ultra-shallow

Summary

This chapter contains sections titled:

  • Introduction

  • Gettering

  • Device Isolation

  • Gate Dielectrics

  • Shallow Junction Formation

  • Metallization

  • Cluster Tool Technology

  • References