Chapter 19. Electrochemical surface processing of semiconductors at the atomic level

  1. Prof. Dr. W. J. Lorenz1 and
  2. Prof. Dr. W. Plieth2
  1. P. Allongue and
  2. C. Henry de Villeneuve

Published Online: 22 DEC 2007

DOI: 10.1002/9783527612154.ch19

Electrochemical Nanotechnology: In-situ Local Probe Techniques at Electrochemical Interfaces

Electrochemical Nanotechnology: In-situ Local Probe Techniques at Electrochemical Interfaces

How to Cite

Allongue, P. and de Villeneuve, C. H. (1998) Electrochemical surface processing of semiconductors at the atomic level, in Electrochemical Nanotechnology: In-situ Local Probe Techniques at Electrochemical Interfaces (eds W. J. Lorenz and W. Plieth), Wiley-VCH Verlag GmbH, Weinheim, Germany. doi: 10.1002/9783527612154.ch19

Editor Information

  1. 1

    Institut für Physikalische Chemie, und Elektrochemie, Universität Karlsruhe, Kaiserstraße 12, D-76131, Karlsruhe

  2. 2

    Institut für Physikalische Chemie, und Elektrochemie, Universität Dresden, Mommsenstraße 13, D-01062, Dresden

Publication History

  1. Published Online: 22 DEC 2007
  2. Published Print: 26 MAR 1998

ISBN Information

Print ISBN: 9783527295203

Online ISBN: 9783527612154

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Keywords:

  • in-situ;
  • anisotropic etching;
  • grafting;
  • tunneling;
  • electrochemical

Summary

This chapter contains sections titled:

  • Introduction

  • Silicon surfaces

  • Sulfide passivation of GaAs surfaces

  • Formation of molecular monolayers

  • Conclusions

  • References