Chapter 4. Preparation of Nanostructures

Summary

This chapter contains sections titled:

• Principles of Fabrication

  • Subtractive and Additive Creation of Nanostructures

  • Nanostructure Generation by Lift-off Processes

  • Principles of Nanotechnical Shape-definition and Construction

• Nanomechanical Structure Generation

  • Scaling Down of Mechanical Processing Techniques

  • Local Mechanical Cutting Processes

  • Surface Transport Methods

  • Reshaping Processes

  • Printing Processes

• Nanolithography

  • Structure Transfer by Electromagnetic Radiation

  • Nanolithographic Transfer of Groups of Elements by Optical Projection

  • EUV and X-ray Lithography

  • Multilayer Resists Techniques with Optical Pattern Transfer

  • Near-field Optical Structure Techniques with Contact Masks

  • Energetic Particles in Nanolithographic Structure Transfer

  • Electron Beam Lithography

  • Ion Beam Lithography

  • Atomic Beam Lithography

  • Molecular and Nanoparticle Beam Lithography

  • Direct Writing of Structures by a Particle Beam

  • Single-particle Beam Processes

  • Nanofabrication by Self-structuring Masks

• Nanofabrication by Scanning Probe Techniques

  • Scanning Force Probes

  • Particle Manipulation With a Scanning Tunneling Microscope (STM)

  • Thermo-mechanical Writing of Nanostructures

  • Electrically Induced Structure Generation by Scanning Probe Techniques

  • Chemical Electrodeless Induced Scanning Probe Structure Generation

  • Nanostructure Generation by Optical Near-field Probes