Chapter 7. The Single Source Approach to the Deposition of Compound Semiconducting Materials by MOCVD and Related Methods

  1. Prof. Anthony C. Jones1 and
  2. Prof. Paul O'Brien2

Published Online: 7 OCT 2008

DOI: 10.1002/9783527614639.ch7

CVD of Compound Semiconductors: Precursor Synthesis, Development and Applications

CVD of Compound Semiconductors: Precursor Synthesis, Development and Applications

How to Cite

Jones, A. C. and O'Brien, P. (1997) The Single Source Approach to the Deposition of Compound Semiconducting Materials by MOCVD and Related Methods, in CVD of Compound Semiconductors: Precursor Synthesis, Development and Applications, Wiley-VCH Verlag GmbH, Weinheim, Germany. doi: 10.1002/9783527614639.ch7

Author Information

  1. 1

    Rosetree Cottage, Georgian Close, Eccleston Park, Prescot, Merseyside L35 7JW, United Kingdom

  2. 2

    Department of Chemistry, Imperial College of Science, Technology and Medicine, South Kensington, London SW7 2AY, United Kingdom

Publication History

  1. Published Online: 7 OCT 2008
  2. Published Print: 10 APR 1997

ISBN Information

Print ISBN: 9783527292943

Online ISBN: 9783527614639

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Keywords:

  • crystal structure;
  • thiomorpholine;
  • pyramidal;
  • bulky electropositive substituents;
  • organoaluminum amide

Summary

The prelims comprise:

  • Introduction

  • Single Source Precursors for III-V Compounds

  • Single-Source Precursors for II-VI Materials

  • Precursors for the Deposition of III-VI Materials

  • References