Chapter 2. Chemical Vapor Deposition of Aluminum

  1. Prof. Dr. Toivo T. Kodas2 and
  2. Prof. Dr. Mark J. Hampden-Smith3
  1. Michael G. Simmonds and
  2. Wayne L. Gladfelter

Published Online: 26 DEC 2007

DOI: 10.1002/9783527615858.ch2

The Chemistry of Metal CVD

The Chemistry of Metal CVD

How to Cite

Simmonds, M. G. and Gladfelter, W. L. (1994) Chemical Vapor Deposition of Aluminum, in The Chemistry of Metal CVD (eds T. T. Kodas and M. J. Hampden-Smith), Wiley-VCH Verlag GmbH, Weinheim, Germany. doi: 10.1002/9783527615858.ch2

Editor Information

  1. 2

    Department of Chemical Engineering, University of New Mexico, Albuquerque, NM 87131, USA

  2. 3

    Department of Chemistry, University of New Mexico, Albuquerque, NM 87131, USA

Author Information

  1. Department of Chemistry, University of Minnesota, Minneapolis, Minnesota 55455

Publication History

  1. Published Online: 26 DEC 2007
  2. Published Print: 25 AUG 1994

ISBN Information

Print ISBN: 9783527290710

Online ISBN: 9783527615858

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Keywords:

  • applications of aluminum films;
  • physical vapor deposition;
  • surface diffusion;
  • triisobutylaluminum;
  • alane precursors

Summary

This chapter contains sections titled:

  • Applications of Aluminum Films

  • Comparison Between Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD) of Aluminum

  • Understanding the CVD Process

  • CVD Using Triisobutylaluminum

  • Deposition of Aluminum from Trimethylaluminum

  • Deposition of Aluminum Films from Alane Precursors

  • Alternative Aluminum Alkyl Sources

  • Summary