Chapter 4. CVD of Copper from Cu(II) Precursors

  1. Prof. Dr. Toivo T. Kodas3 and
  2. Prof. Dr. Mark J. Hampden-Smith4
  1. Gregory L. Griffin1 and
  2. Andrew W. Maverick2

Published Online: 26 DEC 2007

DOI: 10.1002/9783527615858.ch4

The Chemistry of Metal CVD

The Chemistry of Metal CVD

How to Cite

Griffin, G. L. and Maverick, A. W. (1994) CVD of Copper from Cu(II) Precursors, in The Chemistry of Metal CVD (eds T. T. Kodas and M. J. Hampden-Smith), Wiley-VCH Verlag GmbH, Weinheim, Germany. doi: 10.1002/9783527615858.ch4

Editor Information

  1. 3

    Department of Chemical Engineering, University of New Mexico, Albuquerque, NM 87131, USA

  2. 4

    Department of Chemistry, University of New Mexico, Albuquerque, NM 87131, USA

Author Information

  1. 1

    Department of Chemical Engineering, Louisiana State University Baton Rouge, LA 70803

  2. 2

    Department of Chemistry, Louisiana State University, Baton Rouge, LA 70803

Publication History

  1. Published Online: 26 DEC 2007
  2. Published Print: 25 AUG 1994

ISBN Information

Print ISBN: 9783527290710

Online ISBN: 9783527615858

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Keywords:

  • chemical vapor deposition of copper;
  • reactant chemistry;
  • reaction mechanism;
  • molecular adsorption;
  • deposition temperature

Summary

This chapter contains sections titled:

  • Mmduction

  • Historical Review

  • Reactant Chemistry

  • Adsorption Studies

  • Growth Kinetics

  • Film Roperties

  • Reaction Mechanism

  • Rate Expression

  • Reactor Design

  • Plasma-Assisted CVD (PACVD)

  • Laser-Assisted CVD (LCVD)

  • Summary