Chapter 5. Chemical Vapor Deposition of Copper from Cu(I) Compounds

  1. Prof. Dr. Toivo T. Kodas3 and
  2. Prof. Dr. Mark J. Hampden-Smith4
  1. Mark J. Hampden-Smith1 and
  2. Toivo T. Kodas2

Published Online: 26 DEC 2007

DOI: 10.1002/9783527615858.ch5

The Chemistry of Metal CVD

The Chemistry of Metal CVD

How to Cite

Hampden-Smith, M. J. and Kodas, T. T. (2007) Chemical Vapor Deposition of Copper from Cu(I) Compounds, in The Chemistry of Metal CVD (eds T. T. Kodas and M. J. Hampden-Smith), Wiley-VCH Verlag GmbH, Weinheim, Germany. doi: 10.1002/9783527615858.ch5

Editor Information

  1. 3

    Department of Chemical Engineering, University of New Mexico, Albuquerque, NM 87131, USA

  2. 4

    Department of Chemistry, University of New Mexico, Albuquerque, NM 87131, USA

Author Information

  1. 1

    Department of Chemistry, University of New Mexico, Albuquerque, NM 87131

  2. 2

    Department of Chemical Engineering, University of New Mexico, Albuquerque, NM 87131

Publication History

  1. Published Online: 26 DEC 2007
  2. Published Print: 25 AUG 1994

ISBN Information

Print ISBN: 9783527290710

Online ISBN: 9783527615858

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Keywords:

  • chemical vapor deposition of copper;
  • precursor design;
  • degree of oligomerkation;
  • reaction stoichiometry;
  • thermally-induced decomposition

Summary

This chapter contains sections titled:

  • Introduction

  • precursOr Design

  • Synthesis and characterization

  • Physical and Chemical Properties

  • Chemical Vapor Deposition

  • Reaction Stoichiometry, Kinetics, and Mechanisms

  • Selectivity

  • Chemical Vapor Deposition of Copper Alloys

  • Etching

  • Summary and Conclusions