Chapter 7. Chemical Vapor Deposition of Platinum, Palladium and Nickel

  1. Prof. Dr. Toivo T. Kodas3 and
  2. Prof. Dr. Mark J. Hampden-Smith4
  1. Alfred A. Zinn1,
  2. Lutz Brandt1,
  3. Herbert D. Kaesz1 and
  4. Robert F. Hicks2

Published Online: 26 DEC 2007

DOI: 10.1002/9783527615858.ch7

The Chemistry of Metal CVD

The Chemistry of Metal CVD

How to Cite

Zinn, A. A., Brandt, L., Kaesz, H. D. and Hicks, R. F. (1994) Chemical Vapor Deposition of Platinum, Palladium and Nickel, in The Chemistry of Metal CVD (eds T. T. Kodas and M. J. Hampden-Smith), Wiley-VCH Verlag GmbH, Weinheim, Germany. doi: 10.1002/9783527615858.ch7

Editor Information

  1. 3

    Department of Chemical Engineering, University of New Mexico, Albuquerque, NM 87131, USA

  2. 4

    Department of Chemistry, University of New Mexico, Albuquerque, NM 87131, USA

Author Information

  1. 1

    Departments of Chemistry and Biochemistry, University of California, Los Angeles, CA 90024

  2. 2

    Departments of Chemical Engineering, University of California, Los Angeles, CA 90024

Publication History

  1. Published Online: 26 DEC 2007
  2. Published Print: 25 AUG 1994

ISBN Information

Print ISBN: 9783527290710

Online ISBN: 9783527615858

SEARCH

Keywords:

  • chemical vapor deposition of platinum;
  • palladium;
  • nickel;
  • laser-assisted chemical vapor deposition;
  • ion-assisted chemical vapor deposition

Summary

This chapter contains sections titled:

  • Introduction

  • Platinum

  • Palladium

  • Nickel

  • Laser-Assisted CVD

  • Ion-Assisted and Plasma-Asskted CVD

  • Outlook