Chapter 83. Methylsilane Production by Means of Methyldiethoxysilane Catalytic Disproportionation

  1. Prof. Dr. Norbert Auner2 and
  2. Prof. Dr. Johann Weis3
  1. Evgenii Belov,
  2. Galina Dubrovskaya,
  3. Nikolay Efimov,
  4. Salomonida Kleshcevnikova,
  5. Evgenii Korobkov and
  6. Evgenii Lebedev

Published Online: 5 MAY 2008

DOI: 10.1002/9783527619924.ch83

Organosilicon Chemistry V: From Molecules to Materials

Organosilicon Chemistry V: From Molecules to Materials

How to Cite

Belov, E., Dubrovskaya, G., Efimov, N., Kleshcevnikova, S., Korobkov, E. and Lebedev, E. (2003) Methylsilane Production by Means of Methyldiethoxysilane Catalytic Disproportionation, in Organosilicon Chemistry V: From Molecules to Materials (eds N. Auner and J. Weis), Wiley-VCH Verlag GmbH, Weinheim, Germany. doi: 10.1002/9783527619924.ch83

Editor Information

  1. 2

    Department of Inorganic Chemistry, University of Frankfurt, Marie-Curie-Straße 11, 60439 Frankfurt am Main, Germany

  2. 3

    Consortium of Electrochemical Industry GmbH, Zielstattstraße 20, 81379 Munich, Germany

Author Information

  1. Federal State Unitary Enterprise State Research Institute for Chemistry and Technology of Organoelement Compounds, 38 Shosse Entuziastov, Moscow 111123, Russia Tel: +7 95 273 6338 — Fax: +7 95 913 2538

Publication History

  1. Published Online: 5 MAY 2008
  2. Published Print: 26 SEP 2003

ISBN Information

Print ISBN: 9783527306701

Online ISBN: 9783527619924

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Keywords:

  • methylsilane;
  • methyldiethoxysilane;
  • disproportionation;
  • etherification;
  • purification

Summary

Research resulted in basic parameters of disproportionation and etherification; methylsilane and methyldiethoxysilane production techniques were developed. These techniques are based on available raw material, only a small quantity of waste is produced, and the process can be recommended for pilot-scale commercial tests. Recommendations on thorough methylsilane purification are made. The originality of the process is proved by the Russian patent.