Chapter 1. Silicon Processing

  1. Prof. Kenneth A. Jackson2 and
  2. Prof. Dr. Wolfgang Schröter3
  1. John G. Wilkes

Published Online: 28 MAY 2008

DOI: 10.1002/9783527621828.ch1

Handbook of Semiconductor Technology: Processing of Semiconductors, Volume 2

Handbook of Semiconductor Technology: Processing of Semiconductors, Volume 2

How to Cite

Wilkes, J. G. (2000) Silicon Processing, in Handbook of Semiconductor Technology: Processing of Semiconductors, Volume 2 (eds K. A. Jackson and W. Schröter), Wiley-VCH Verlag GmbH, Weinheim, Germany. doi: 10.1002/9783527621828.ch1

Editor Information

  1. 2

    The University of Arizona, Arizona Materials Laboratory, 4715 E. Fort Lowell Road, Tucson, AZ 85712, USA

  2. 3

    IV. Physikalisches Institut der Georg-August-Universität Göttingen, Bunsenstraße 13–15, D-37073 Göttingen, Germany

Author Information

  1. Formerly with Philips Components Ltd., Southampton. U.K.

Publication History

  1. Published Online: 28 MAY 2008
  2. Published Print: 27 JUN 2000

ISBN Information

Print ISBN: 9783527298358

Online ISBN: 9783527621828

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Keywords:

  • electronics manufacturers;
  • lithographic;
  • monocrystals;
  • metallurgical-grade silicon;
  • pelletization

Summary

The chapter contains sections titled:

  • Introduction

  • Metallurgical-Grade Silicon

  • Semiconductor Grade Polycrystal Silicon

  • Single Crystal Silicon

  • Czochralski Silicon

  • Wafer preparation

  • Oxygen in Czochralski Silicon

  • Gettering Engineering

  • Acknowledgements

  • References