Chapter 4. Photolithography

  1. Prof. Kenneth A. Jackson3 and
  2. Prof. Dr. Wolfgang Schröter4
  1. Rainer Leuschner1 and
  2. Georg Pawlowski2

Published Online: 28 MAY 2008

DOI: 10.1002/9783527621828.ch4

Handbook of Semiconductor Technology: Processing of Semiconductors, Volume 2

Handbook of Semiconductor Technology: Processing of Semiconductors, Volume 2

How to Cite

Leuschner, R. and Pawlowski, G. (2008) Photolithography, in Handbook of Semiconductor Technology: Processing of Semiconductors, Volume 2 (eds K. A. Jackson and W. Schröter), Wiley-VCH Verlag GmbH, Weinheim, Germany. doi: 10.1002/9783527621828.ch4

Editor Information

  1. 3

    The University of Arizona, Arizona Materials Laboratory, 4715 E. Fort Lowell Road, Tucson, AZ 85712, USA

  2. 4

    IV. Physikalisches Institut der Georg-August-Universität Göttingen, Bunsenstraße 13–15, D-37073 Göttingen, Germany

Author Information

  1. 1

    Infineon Technology, Memory Products, Erlangen, Germany

  2. 2

    Clariant Japan K. K., BU Electronic Materials, Shizuoka, Japan

Publication History

  1. Published Online: 28 MAY 2008
  2. Published Print: 27 JUN 2000

ISBN Information

Print ISBN: 9783527298358

Online ISBN: 9783527621828

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Keywords:

  • photolithography;
  • microelectronic circuits;
  • monocrystalline;
  • X-ray;
  • gas/halogen molecules

Summary

The chapter contains sections titled:

  • Introduction

  • Exposure Tools

  • Photoresist Processing

  • Photoresists

  • Special Photoresist Techniques

  • Trends in Photolithography

  • References