Chapter 7. Silicon Device Structures

  1. Prof. Kenneth A. Jackson2 and
  2. Prof. Dr. Wolfgang Schröter3
  1. Chun-Yen Chang and
  2. Simon M. Sze

Published Online: 28 MAY 2008

DOI: 10.1002/9783527621828.ch7

Handbook of Semiconductor Technology: Processing of Semiconductors, Volume 2

Handbook of Semiconductor Technology: Processing of Semiconductors, Volume 2

How to Cite

Chang, C.-Y. and Sze, S. M. (2000) Silicon Device Structures, in Handbook of Semiconductor Technology: Processing of Semiconductors, Volume 2 (eds K. A. Jackson and W. Schröter), Wiley-VCH Verlag GmbH, Weinheim, Germany. doi: 10.1002/9783527621828.ch7

Editor Information

  1. 2

    The University of Arizona, Arizona Materials Laboratory, 4715 E. Fort Lowell Road, Tucson, AZ 85712, USA

  2. 3

    IV. Physikalisches Institut der Georg-August-Universität Göttingen, Bunsenstraße 13–15, D-37073 Göttingen, Germany

Author Information

  1. National Chiao Tung University, Hsinchu, Taiwan, R.O.C.

Publication History

  1. Published Online: 28 MAY 2008
  2. Published Print: 27 JUN 2000

ISBN Information

Print ISBN: 9783527298358

Online ISBN: 9783527621828

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Keywords:

  • semiconductor devices;
  • silicon dioxide;
  • heterojunction bipolar;
  • photonic devices;
  • metallurgical junction

Summary

The chapter contains sections titled:

  • Introduction

  • Potential-Effect Devices

  • Field-Effect Devices

  • Quantum-Effect Devices

  • Microwave and Photonic Diodes

  • Outlook

  • Acknowledgements

  • References