Chapter 10. Plasma CVD Processes for Thin Film Silicon Solar Cells

  1. Prof. Riccardo d'Agostino2,
  2. Prof. Pietro Favia2,
  3. Prof. Yoshinobu Kawai3,
  4. Prof. Hideo Ikegami4,
  5. Prof. Noriyoshi Sato5 and
  6. Prof. Farzaneh Arefi-Khonsari6
  1. A. Matsuda

Published Online: 8 APR 2008

DOI: 10.1002/9783527622184.ch10

Advanced Plasma Technology

Advanced Plasma Technology

How to Cite

Matsuda, A. (2007) Plasma CVD Processes for Thin Film Silicon Solar Cells, in Advanced Plasma Technology (eds R. d'Agostino, P. Favia, Y. Kawai, H. Ikegami, N. Sato and F. Arefi-Khonsari), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527622184.ch10

Editor Information

  1. 2

    Department of Chemistry, University of Bari, Via Orabona 4, 70126 Bari, Italy

  2. 3

    Research Institute for Applied Mechanics, Kyushu University, Engineering Sciences, Kasugakoen 6-1, Kasuga, Fukuoka 816-8580, Japan

  3. 4

    National Institute for Fusion Science, Toki, Gifu 509-5292, Japan

  4. 5

    Graduate School of Engineering, Tohoku University, Kadan 4-17-113, Sendai 980-0815, Japan

  5. 6

    Laboratoire de Génie des Procédés, Plasma et Traitements de Surface, Université Pierre et Marie Curie, ENSCP, 11 rue Pierre et Marie Curie, 75231 Paris cedex 05, France

Author Information

  1. Tokyo University of Science, 2641 Yamazaki, Noda-shi, Chiba 278-8510, Japan

Publication History

  1. Published Online: 8 APR 2008
  2. Published Print: 12 DEC 2007

ISBN Information

Print ISBN: 9783527405916

Online ISBN: 9783527622184

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