Chapter 19. Hydrocarbon and Fluorocarbon Thin Film Deposition in Atmospheric Pressure Glow Dielectric Barrier Discharges

  1. Prof. Riccardo d'Agostino1,
  2. Prof. Pietro Favia1,
  3. Prof. Yoshinobu Kawai2,
  4. Prof. Hideo Ikegami3,
  5. Prof. Noriyoshi Sato4 and
  6. Prof. Farzaneh Arefi-Khonsari5
  1. F. Fanelli,
  2. Prof. R. d'Agostino and
  3. F. Fracassi

Published Online: 8 APR 2008

DOI: 10.1002/9783527622184.ch19

Advanced Plasma Technology

Advanced Plasma Technology

How to Cite

Fanelli, F., d'Agostino, R. and Fracassi, F. (2007) Hydrocarbon and Fluorocarbon Thin Film Deposition in Atmospheric Pressure Glow Dielectric Barrier Discharges, in Advanced Plasma Technology (eds R. d'Agostino, P. Favia, Y. Kawai, H. Ikegami, N. Sato and F. Arefi-Khonsari), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527622184.ch19

Editor Information

  1. 1

    Department of Chemistry, University of Bari, Via Orabona 4, 70126 Bari, Italy

  2. 2

    Research Institute for Applied Mechanics, Kyushu University, Engineering Sciences, Kasugakoen 6-1, Kasuga, Fukuoka 816-8580, Japan

  3. 3

    National Institute for Fusion Science, Toki, Gifu 509-5292, Japan

  4. 4

    Graduate School of Engineering, Tohoku University, Kadan 4-17-113, Sendai 980-0815, Japan

  5. 5

    Laboratoire de Génie des Procédés, Plasma et Traitements de Surface, Université Pierre et Marie Curie, ENSCP, 11 rue Pierre et Marie Curie, 75231 Paris cedex 05, France

Author Information

  1. Department of Chemistry, University of Bari, Via Orabona 4, 70126 Bari, Italy

Publication History

  1. Published Online: 8 APR 2008
  2. Published Print: 12 DEC 2007

ISBN Information

Print ISBN: 9783527405916

Online ISBN: 9783527622184

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