Chapter 3. Advanced Simulations for Industrial Plasma Applications

  1. Prof. Riccardo d'Agostino4,
  2. Prof. Pietro Favia4,
  3. Prof. Yoshinobu Kawai5,
  4. Prof. Hideo Ikegami6,
  5. Prof. Noriyoshi Sato7 and
  6. Prof. Farzaneh Arefi-Khonsari8
  1. S. J. Kim1,
  2. F. Iza1,
  3. N. Babaeva2,
  4. S. H. Lee1,
  5. H. J. Lee3 and
  6. J. K. Lee1

Published Online: 8 APR 2008

DOI: 10.1002/9783527622184.ch3

Advanced Plasma Technology

Advanced Plasma Technology

How to Cite

Kim, S. J., Iza, F., Babaeva, N., Lee, S. H., Lee, H. J. and Lee, J. K. (2007) Advanced Simulations for Industrial Plasma Applications, in Advanced Plasma Technology (eds R. d'Agostino, P. Favia, Y. Kawai, H. Ikegami, N. Sato and F. Arefi-Khonsari), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527622184.ch3

Editor Information

  1. 4

    Department of Chemistry, University of Bari, Via Orabona 4, 70126 Bari, Italy

  2. 5

    Research Institute for Applied Mechanics, Kyushu University, Engineering Sciences, Kasugakoen 6-1, Kasuga, Fukuoka 816-8580, Japan

  3. 6

    National Institute for Fusion Science, Toki, Gifu 509-5292, Japan

  4. 7

    Graduate School of Engineering, Tohoku University, Kadan 4-17-113, Sendai 980-0815, Japan

  5. 8

    Laboratoire de Génie des Procédés, Plasma et Traitements de Surface, Université Pierre et Marie Curie, ENSCP, 11 rue Pierre et Marie Curie, 75231 Paris cedex 05, France

Author Information

  1. 1

    Department of Electronic and Electrical Engineering, Pohang University of Science and Technology, Pohang 790-784, South Korea

  2. 2

    Department of Electrical and Computer Engineering, Iowa State University, Ames, IA 50011, USA

  3. 3

    Busan National University, Busan 609-735, South Korea

Publication History

  1. Published Online: 8 APR 2008
  2. Published Print: 12 DEC 2007

ISBN Information

Print ISBN: 9783527405916

Online ISBN: 9783527622184

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Keywords:

  • industrial plasma applications;
  • PIC simulations;
  • fluid simulations

Summary

This chapter contains sections titled:

  • Introduction

  • PIC Simulations

    • Capacitively Coupled O2/Ar Plasmas

      • Gas Composition

      • Pressure Effect in Ar/O2 Plasmas

    • Three-Dimensional (3D) Charge-up Simulation

      • Description of 3D Charge-up Simulations

      • Effects of Secondary Electron Emission

      • Negative Ion Extraction

  • Fluid Simulations

    • Capacitively Coupled Discharges

    • Large Area Plasma Source

  • Summary