Chapter 9. Fundamentals on Plasma Deposition of Fluorocarbon Films

  1. Prof. Riccardo d'Agostino2,
  2. Prof. Pietro Favia2,
  3. Prof. Yoshinobu Kawai3,
  4. Prof. Hideo Ikegami4,
  5. Prof. Noriyoshi Sato5 and
  6. Prof. Farzaneh Arefi-Khonsari6
  1. A. Milella2,
  2. F. Palumbo1 and
  3. R. d'Agostino2

Published Online: 8 APR 2008

DOI: 10.1002/9783527622184.ch9

Advanced Plasma Technology

Advanced Plasma Technology

How to Cite

Milella, A., Palumbo, F. and d'Agostino, R. (2007) Fundamentals on Plasma Deposition of Fluorocarbon Films, in Advanced Plasma Technology (eds R. d'Agostino, P. Favia, Y. Kawai, H. Ikegami, N. Sato and F. Arefi-Khonsari), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527622184.ch9

Editor Information

  1. 2

    Department of Chemistry, University of Bari, Via Orabona 4, 70126 Bari, Italy

  2. 3

    Research Institute for Applied Mechanics, Kyushu University, Engineering Sciences, Kasugakoen 6-1, Kasuga, Fukuoka 816-8580, Japan

  3. 4

    National Institute for Fusion Science, Toki, Gifu 509-5292, Japan

  4. 5

    Graduate School of Engineering, Tohoku University, Kadan 4-17-113, Sendai 980-0815, Japan

  5. 6

    Laboratoire de Génie des Procédés, Plasma et Traitements de Surface, Université Pierre et Marie Curie, ENSCP, 11 rue Pierre et Marie Curie, 75231 Paris cedex 05, France

Author Information

  1. 1

    Institute of Inorganic Methodologies and Plasmas, IMIP-CNR, via Orabona 4, 70126 Bari, Italy

  2. 2

    Department of Chemistry, University of Bari, Via Orabona 4, 70126 Bari, Italy

Publication History

  1. Published Online: 8 APR 2008
  2. Published Print: 12 DEC 2007

ISBN Information

Print ISBN: 9783527405916

Online ISBN: 9783527622184

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Keywords:

  • plasma deposition;
  • fluorocarbon films;
  • continuous discharges;
  • glow discharges

Summary

This chapter contains sections titled:

  • Deposition of Fluorocarbon Films by Continuous Discharges

    • Active Species in Fluorocarbon Plasmas

    • Effect of Ion Bombardment

    • The Activated Growth Model

  • Afterglow Deposition of Fluorocarbon Films

  • Deposition of Fluorocarbon Films by Modulated Glow Discharges

  • Deposition of Nanostructured Thin Films from Tetrafluoroethylene Glow Discharges