Chapter 12. Crystal-Growth Technology for Ternary III-V Semiconductor Production by Vertical Bridgman and Vertical Gradient Freezing Methods with Accelerated Crucible Rotation Technique
- Dr.-Ing. Hans J. Scheel2 and
- Dr. Peter Capper3
Published Online: 25 NOV 2008
Copyright © 2008 Wiley-VCH Verlag GmbH & Co. KGaA
Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production
How to Cite
Dutta, P. S. (2008) Crystal-Growth Technology for Ternary III-V Semiconductor Production by Vertical Bridgman and Vertical Gradient Freezing Methods with Accelerated Crucible Rotation Technique, in Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production (eds H. J. Scheel and P. Capper), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527623440.ch12
Scheel Consulting, Grönstrasse Haus Anatas, 3803 Beatenberg, Switzerland
SELEX Sensors and Airborne, Systems Infrared Ltd., P.O. Box 217, Millbrook, Southampton SO1 5EG, United Kingdom
- Published Online: 25 NOV 2008
- Published Print: 16 JAN 2008
Print ISBN: 9783527317622
Online ISBN: 9783527623440
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