Chapter 13. X-Ray Diffraction Imaging of Industrial Crystals

  1. Dr.-Ing. Hans J. Scheel2 and
  2. Dr. Peter Capper3
  1. Keith Bowen,
  2. David Jacques,
  3. Petra Feichtinger and
  4. Matthew Wormington

Published Online: 25 NOV 2008

DOI: 10.1002/9783527623440.ch13

Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production

Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production

How to Cite

Bowen, K., Jacques, D., Feichtinger, P. and Wormington, M. (2008) X-Ray Diffraction Imaging of Industrial Crystals, in Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production (eds H. J. Scheel and P. Capper), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527623440.ch13

Editor Information

  1. 2

    Scheel Consulting, Grönstrasse Haus Anatas, 3803 Beatenberg, Switzerland

  2. 3

    SELEX Sensors and Airborne, Systems Infrared Ltd., P.O. Box 217, Millbrook, Southampton SO1 5EG, United Kingdom

Author Information

  1. BEDE X-ray Metrology, Belmont Business Park, Durham DH1 1TW, UK

Publication History

  1. Published Online: 25 NOV 2008
  2. Published Print: 16 JAN 2008

ISBN Information

Print ISBN: 9783527317622

Online ISBN: 9783527623440

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Keywords:

  • X-ray diffraction imaging (XRDI);
  • wafer;
  • defect(s);
  • dislocations;
  • ship bands

Summary

This chapter contains sections titled:

  • Introduction

  • Digital X-Ray Diffraction Imaging

  • Applications Examples

  • Summary

  • References