Chapter 19. Plasma Chemical Vaporization Machining and Elastic Emission Machining

  1. Dr.-Ing. Hans J. Scheel4 and
  2. Dr. Peter Capper5
  1. Yasuhisa Sano1,
  2. Kazuya Yamamura2,
  3. Hidekazu Mimura2,
  4. Kazuto Yamauchi3 and
  5. Yuzo Mori2

Published Online: 25 NOV 2008

DOI: 10.1002/9783527623440.ch19

Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production

Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production

How to Cite

Sano, Y., Yamamura, K., Mimura, H., Yamauchi, K. and Mori, Y. (2008) Plasma Chemical Vaporization Machining and Elastic Emission Machining, in Crystal Growth Technology: From Fundamentals and Simulation to Large-scale Production (eds H. J. Scheel and P. Capper), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527623440.ch19

Editor Information

  1. 4

    Scheel Consulting, Grönstrasse Haus Anatas, 3803 Beatenberg, Switzerland

  2. 5

    SELEX Sensors and Airborne, Systems Infrared Ltd., P.O. Box 217, Millbrook, Southampton SO1 5EG, United Kingdom

Author Information

  1. 1

    Osaka University, 2-1 Yamada-Oka, Suita, Osaka 565-0871, Japan

  2. 2

    Osaka University, Research Center for Ultra-Precision Science and Technology, 2-1 Yakadaoka, Suita, Osaka 565-0871, Japan

  3. 3

    Osaka University, 2-1 Yakadaoka, Suita, Osaka 565-0871, Japan

Publication History

  1. Published Online: 25 NOV 2008
  2. Published Print: 16 JAN 2008

ISBN Information

Print ISBN: 9783527317622

Online ISBN: 9783527623440

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Keywords:

  • plasma chemical vaporization machining (PCVM);
  • elastic emission machining (EEM);
  • catalyst-referred etching (CARE);
  • ultraprecision machining

Summary

This chapter contains sections titled:

  • Introduction

  • Plasma Chemical Vaporization Machining (PCVM)

  • Elastic Emission Machining

  • Catalyst-Referred Etching

  • Acknowledgements

  • References