21. Diagnostics and Modeling of SiH4/H2 Plasmas for the Deposition of Microcrystalline Silicon: The Case of Dual-Frequency Sources

  1. Prof. Yoshinobu Kawai Research Professor2,
  2. Prof. Hideo Ikegami Professor Emeritus3,4,
  3. Prof. Noriyoshi Sato Professor Emeritus5,
  4. Prof. Akihisa Matsuda Special Guest Professor Director6,7,
  5. Prof. Kiichiro Uchino Professor8,
  6. Prof. Masayuki Kuzuya Dean Professor9 and
  7. Prof. Akira Mizuno Professor10
  1. Eleftherios Amanatides and
  2. Dimitrios Mataras

Published Online: 7 OCT 2010

DOI: 10.1002/9783527629749.ch21

Industrial Plasma Technology: Applications from Environmental to Energy Technologies

Industrial Plasma Technology: Applications from Environmental to Energy Technologies

How to Cite

Amanatides, E. and Mataras, D. (2010) Diagnostics and Modeling of SiH4/H2 Plasmas for the Deposition of Microcrystalline Silicon: The Case of Dual-Frequency Sources, in Industrial Plasma Technology: Applications from Environmental to Energy Technologies (eds Y. Kawai, H. Ikegami, N. Sato, A. Matsuda, K. Uchino, M. Kuzuya and A. Mizuno), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527629749.ch21

Editor Information

  1. 2

    Kyushu University, Interdisciplinary Graduate School of Engineering Sciences, Kasugakoen 6-1, Kasuga, 816-8580, Japan

  2. 3

    Technowave Inc., 13-18 Aoi 1-chome, Higashi-ku, Nagoya-shi Aichi 461-0004, Japan

  3. 4

    Nagoya University and National Institute for Fusion Science, Shiga 24-601, Nagoya 462-0037, Japan

  4. 5

    Graduate School of Engineering, Tohoku University, Kadan 4-17-113, Sendai 980-0815, Japan

  5. 6

    Osaka University, Grad. School of Engineering Science, Machikaneyama-cho 1-3, Toyonaka, Osaka 565-0871, Japan

  6. 7

    Osaka University, Graduate School of Engineering Science, Toyonaka, Osaka, 560-8531, Japan

  7. 8

    Kyushu University, Interdisciplinary Graduate School of Engineering Sciences, Kasugakoen 6-1, Kasuga, Fukuoka 816-8580, Japan

  8. 9

    Matsuyama University, Department of Pharmaceutical Physical Chemistry, Faculty of Pharmaceutical Sciences, 4-2 Bunkyo-cho, Matsuyama, Ehime 790-8578, Japan

  9. 10

    Toyohashi University of Technology, Department of Ecological Engineering, Hibarigaoka 1-1, Tempaku-cho, Toyohashi, Aichi, 441–8580, Japan

Author Information

  1. University of Patras, Department of Chemical Engineering, Plasma Technology Laboratory, P.O. Box 1407, Patras, 26504, Greece

Publication History

  1. Published Online: 7 OCT 2010
  2. Published Print: 10 MAR 2010

ISBN Information

Print ISBN: 9783527325443

Online ISBN: 9783527629749

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