25. Plasma Processing of Nanocrystalline Semiconductive Cubic Boron Nitride Thin Films

  1. Prof. Yoshinobu Kawai Research Professor3,
  2. Prof. Hideo Ikegami Professor Emeritus4,5,
  3. Prof. Noriyoshi Sato Professor Emeritus6,
  4. Prof. Akihisa Matsuda Special Guest Professor Director7,8,
  5. Prof. Kiichiro Uchino Professor9,
  6. Prof. Masayuki Kuzuya Dean Professor10 and
  7. Prof. Akira Mizuno Professor11
  1. Kenji Nose1 and
  2. Toyonobu Yoshida2

Published Online: 7 OCT 2010

DOI: 10.1002/9783527629749.ch25

Industrial Plasma Technology: Applications from Environmental to Energy Technologies

Industrial Plasma Technology: Applications from Environmental to Energy Technologies

How to Cite

Nose, K. and Yoshida, T. (2010) Plasma Processing of Nanocrystalline Semiconductive Cubic Boron Nitride Thin Films, in Industrial Plasma Technology: Applications from Environmental to Energy Technologies (eds Y. Kawai, H. Ikegami, N. Sato, A. Matsuda, K. Uchino, M. Kuzuya and A. Mizuno), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527629749.ch25

Editor Information

  1. 3

    Kyushu University, Interdisciplinary Graduate School of Engineering Sciences, Kasugakoen 6-1, Kasuga, 816-8580, Japan

  2. 4

    Technowave Inc., 13-18 Aoi 1-chome, Higashi-ku, Nagoya-shi Aichi 461-0004, Japan

  3. 5

    Nagoya University and National Institute for Fusion Science, Shiga 24-601, Nagoya 462-0037, Japan

  4. 6

    Graduate School of Engineering, Tohoku University, Kadan 4-17-113, Sendai 980-0815, Japan

  5. 7

    Osaka University, Grad. School of Engineering Science, Machikaneyama-cho 1-3, Toyonaka, Osaka 565-0871, Japan

  6. 8

    Osaka University, Graduate School of Engineering Science, Toyonaka, Osaka, 560-8531, Japan

  7. 9

    Kyushu University, Interdisciplinary Graduate School of Engineering Sciences, Kasugakoen 6-1, Kasuga, Fukuoka 816-8580, Japan

  8. 10

    Matsuyama University, Department of Pharmaceutical Physical Chemistry, Faculty of Pharmaceutical Sciences, 4-2 Bunkyo-cho, Matsuyama, Ehime 790-8578, Japan

  9. 11

    Toyohashi University of Technology, Department of Ecological Engineering, Hibarigaoka 1-1, Tempaku-cho, Toyohashi, Aichi, 441–8580, Japan

Author Information

  1. 1

    University of Tokyo, Institute of Industrial Science, 4-6-1 Komaba, Meguro-ku, Tokyo, 153-8505, Japan

  2. 2

    University of Tokyo, School of Engineering, Department of Materials Engineering, 7-3-1 Hongo, Bunkyo-ku, Tokyo, 113-8656, Japan

Publication History

  1. Published Online: 7 OCT 2010
  2. Published Print: 10 MAR 2010

ISBN Information

Print ISBN: 9783527325443

Online ISBN: 9783527629749

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Keywords:

  • cBN thin films;
  • nucleation and growth;
  • wide bandgap;
  • electrical properties;
  • doping effects

Summary

This chapter contains sections titled:

  • Introduction

  • Fundamental Properties of cBN

  • Growth of cBN Thin Films

  • Doping Processes and Electrical Characterization

  • Conclusion

  • References