8. Applications of Controlled Macromolecular Architectures to Lithography

  1. Prof. Dr. Krzysztof Matyjaszewski3,
  2. Prof. Dr. Yves Gnanou4 and
  3. Prof. Dr. Ludwik Leibler5,6
  1. Daniel Bratton1,
  2. Ramakrishnan Ayothi1,
  3. Nelson Felix1 and
  4. Christopher K. Ober2

Published Online: 23 SEP 2011

DOI: 10.1002/9783527631421.ch55

Macromolecular Engineering: Precise Synthesis, Materials Properties, Applications

Macromolecular Engineering: Precise Synthesis, Materials Properties, Applications

How to Cite

Bratton, D., Ayothi, R., Felix, N. and Ober, C. K. (2007) Applications of Controlled Macromolecular Architectures to Lithography, in Macromolecular Engineering: Precise Synthesis, Materials Properties, Applications (eds K. Matyjaszewski, Y. Gnanou and L. Leibler), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527631421.ch55

Editor Information

  1. 3

    Carnegie Mellon University, Department of Chemistry, 4400 Fifth Avenue, Pittsburgh, PA 15213, USA

  2. 4

    Université Bordeaux 1, Laboratoire de Chimie des Polymères Organiques, ENSCPB, 16 avenue Pey-Berland, 33607 Pessac, France

  3. 5

    Matière Molle et Chimie, UMR 167 CNRS, ESPCI, 10 rue Vauquelin, 75005 Paris, France

  4. 6

    UMR 167 CNRS-ESPCI École Supérieure de Physique et Chimie Industrielles, 10 rue Vauquelin, 75231 Paris Cedex 05, France

Author Information

  1. 1

    Cornell University, Department of Materials Science and Engineering, Bard Hall, Ithaca, NY 14853-1501, USA

  2. 2

    Cornell University, Department of Materials Science and Engineering, 310 Bard Hall, Ithaca, NY 14853-1501, USA

Publication History

  1. Published Online: 23 SEP 2011
  2. Published Print: 23 FEB 2007

ISBN Information

Print ISBN: 9783527314461

Online ISBN: 9783527631421

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Keywords:

  • applications;
  • controlled macromolecular architectures;
  • lithography;
  • specialized nanofabrication;
  • macromolecules;
  • resists for photolithography;
  • block copolymers;
  • two-photon lithography

Summary

This chapter contains sections titled:

  • Introduction

  • Specialized Nanofabrication

  • Macromolecules as Resists for Photolithography

  • Block Copolymers

  • Two-photon Lithography

  • Conclusion

  • Acknowledgments

  • References