9. Matching, Resonance and Stability

  1. Dr. John Ernest Harry

Published Online: 11 OCT 2010

DOI: 10.1002/9783527632169.ch9

Introduction to Plasma Technology: Science, Engineering and Applications

Introduction to Plasma Technology: Science, Engineering and Applications

How to Cite

Harry, J. E. (2010) Matching, Resonance and Stability, in Introduction to Plasma Technology: Science, Engineering and Applications, Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527632169.ch9

Author Information

  1. Highview, Knossington Road, Braunston, Oakham, Rutland LE15 8QX, United Kingdom

Publication History

  1. Published Online: 11 OCT 2010
  2. Published Print: 13 OCT 2010

ISBN Information

Print ISBN: 9783527327638

Online ISBN: 9783527632169

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Keywords:

  • matching;
  • resonance;
  • plasma characteristic;
  • plasma stabilization;
  • parasitic inductance;
  • parasitic capacitance

Summary

This chapter contains sections titled:

  • Introduction

  • The Plasma Characteristic

  • Stabilizing Methods

  • Effect of Frequency

  • Interaction between the Plasma and Power Supply Time Constants

  • Matching

  • Resonance

  • Parasitic Inductance and Capacitance

  • Further Reading