5. Optical Vortex Metrology

  1. Prof. Guillermo H. Kaufmann4,5
  1. Wei Wang1,
  2. Steen G. Hanson2 and
  3. Mitsuo Takeda3

Published Online: 21 FEB 2011

DOI: 10.1002/9783527633852.ch5

Advances in Speckle Metrology and Related Techniques

Advances in Speckle Metrology and Related Techniques

How to Cite

Wang, W., Hanson, S. G. and Takeda, M. (2011) Optical Vortex Metrology, in Advances in Speckle Metrology and Related Techniques (ed G. H. Kaufmann), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527633852.ch5

Editor Information

  1. 4

    Instituto de Fisica Rosario, Universidad Nacional de Rosario, Facultad de Ciencias Exactas e Ingeniería, Department of Physics and Centro Internacional Franco Argentino de Ciencias, de la Información y de Sistemas, Rosario, Argentina

  2. 5

    Instituto de Fisica Rosario, Blvd. 27 de Febrero 210 bis, S2000EZP Rosario, Argentina

Author Information

  1. 1

    Heriot-Watt University, School of Engineering and Physical Sciences, Department of Mechanical Engineering, Edinburgh EH14 4AS, United Kingdom

  2. 2

    Technical University of Denmark, Department of Photonics Engineering, DTU Fotonik, Frederiksborgvej 399, Building 128, P.O. Box 49, 4000 Roskilde, Denmark

  3. 3

    The University of Electro-Communications, Department of Information and Communication Engineering, Laboratory for Information Photonics and Wave Signal Processing, 1-5-1, Chofugaoka, Chofu, 182-8585 Tokyo, Japan

Publication History

  1. Published Online: 21 FEB 2011
  2. Published Print: 23 FEB 2011

ISBN Information

Print ISBN: 9783527409570

Online ISBN: 9783527633852

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Keywords:

  • fluid mechanical analysis;
  • nanometric displacement measurement;
  • optical vortex metrology (OVM);
  • speckle photography

Summary

Speckle photography, whose basic idea is to compare images of speckle intensity patterns, one from a rough object in an initial state and a second from the same object after it is subjected to some form of displacement, has been studied, and various techniques are developed. This chapter elucidates some of these techniques and the associated benefits supported by experimental findings with emphasis on singularities in the pseudophase map. The negative-exponential probability density function for the intensity of a fully developed speckle pattern attains its maximum value at zero intensity. The chapter explains optical vortex metrology (OVM), and reviews the two-dimensional complex signal representation of a speckle pattern. Among various applications of speckle photography, in-plane displacement measurement is one of the most fundamental and important ones. The chapter introduces OVM from its application to nanometric displacement measurement. Experiments are conducted to extend the application of OVM to fluid mechanical investigations.

Controlled Vocabulary Terms

displacement measurement; electronic speckle pattern interferometry; fluid mechanics; optical vortices