6. Low-Temperature Atomic Layer Deposition

  1. Prof. Dr. Nicola Pinna3,4 and
  2. Dr. Mato Knez5
  1. Jens Meyer1 and
  2. Thomas Riedl2

Published Online: 2 JAN 2012

DOI: 10.1002/9783527639915.ch6

Atomic Layer Deposition of Nanostructured Materials

Atomic Layer Deposition of Nanostructured Materials

How to Cite

Meyer, J. and Riedl, T. (2011) Low-Temperature Atomic Layer Deposition, in Atomic Layer Deposition of Nanostructured Materials (eds N. Pinna and M. Knez), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527639915.ch6

Editor Information

  1. 3

    Department of Chemistry and CICECO, University of Aveiro, Campus Universitario de Santiago, 3810-193 Aveiro, Portugal

  2. 4

    Seoul National University (SNU), School of Chemical and Biological Engineering, College of Engineering, World Class University (WCU) Program of Chemical Convergence for Energy & Environment (C2E2), 151-744 Seoul, Korea

  3. 5

    MPI für Mikrostrukturphysik, Experimental Dept. II, Weinberg 2, 06120 Halle, Germany

Author Information

  1. 1

    Princeton University, Department of Electrical Engineering, Olden Street, Princeton, NJ 08544, USA

  2. 2

    University of Wuppertal, Institute of Electronic Devices, Rainer-Gruenter-Str. 21, 42119 Wuppertal, Germany

Publication History

  1. Published Online: 2 JAN 2012
  2. Published Print: 23 NOV 2011

ISBN Information

Print ISBN: 9783527327973

Online ISBN: 9783527639915

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Keywords:

  • gas diffusion barrier;
  • low-temperature atomic layer deposition;
  • organic light emitting diodes;
  • organic photovoltaic cells;
  • thin film transistors;
  • water vapor transmission rate

Summary

This chapter contains sections titled:

  • Introduction

  • Challenges of LT-ALD

  • Materials and Processes

  • Toward Novel LT-ALD Processes

  • Thin Film Gas Diffusion Barriers

  • Encapsulation of Organic Electronics

  • Conclusions

  • References