15. High-k Dielectrics in Ferroelectric Gate Field Effect Transistors for Nonvolatile Memory Applications
- Prof. Gang He and
- Prof. Zhaoqi Sun
Published Online: 23 AUG 2012
Copyright © 2012 Wiley-VCH Verlag GmbH & Co. KGaA
High-k Gate Dielectrics for CMOS Technology
How to Cite
Lu, X. (2012) High-k Dielectrics in Ferroelectric Gate Field Effect Transistors for Nonvolatile Memory Applications, in High-k Gate Dielectrics for CMOS Technology (eds G. He and Z. Sun), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527646340.ch15
Anhui University, School of Physics and Materials Science, Anhui Key Laboratory of Information Materials and Devices, Feixi Road 3, Hefei 230039, China
- Published Online: 23 AUG 2012
- Published Print: 22 AUG 2012
Print ISBN: 9783527330324
Online ISBN: 9783527646340
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