8. High-k Insulating Films on Semiconductors and Metals: General Trends in Electron Band Alignment

  1. Prof. Gang He and
  2. Prof. Zhaoqi Sun
  1. Valeri V. Afanas'ev,
  2. Michel Houssa and
  3. Andre Stesmans

Published Online: 23 AUG 2012

DOI: 10.1002/9783527646340.ch8

High-k Gate Dielectrics for CMOS Technology

High-k Gate Dielectrics for CMOS Technology

How to Cite

Afanas'ev, V. V., Houssa, M. and Stesmans, A. (2012) High-k Insulating Films on Semiconductors and Metals: General Trends in Electron Band Alignment, in High-k Gate Dielectrics for CMOS Technology (eds G. He and Z. Sun), Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim, Germany. doi: 10.1002/9783527646340.ch8

Editor Information

  1. Anhui University, School of Physics and Materials Science, Anhui Key Laboratory of Information Materials and Devices, Feixi Road 3, Hefei 230039, China

Author Information

  1. University of Leuven, Department of Physics and Astronomy, Laboratory of Semiconductor Physics, Celestijnenlaan 200D, 3001 Leuven, Belgium

Publication History

  1. Published Online: 23 AUG 2012
  2. Published Print: 22 AUG 2012

ISBN Information

Print ISBN: 9783527330324

Online ISBN: 9783527646340

SEARCH

Options for accessing this content:

  • If you are a society or association member and require assistance with obtaining online access instructions please contact our Journal Customer Services team.
    http://wiley.force.com/Interface/ContactJournalCustomerServices_V2.
  • Login via other institutional login options http://onlinelibrary.wiley.com/login-options.
  • You can purchase online access to this Chapter for a 24-hour period (price varies by title)
    • If you already have a Wiley Online Library or Wiley InterScience user account: login above and proceed to purchase the article.
    • New Users: Please register, then proceed to purchase the article.

Login via OpenAthens

or

Search for your institution's name below to login via Shibboleth.

Please register to:

  • Save publications, articles and searches
  • Get email alerts
  • Get all the benefits mentioned below!

Register now >