This research receives funding from the “Laboratoire National de Métrologie at d'Essais”, from the European Union on the basis of Decision No. 912/2009/EC, and was partially supported by “MONADS” Project (code No. 2009–2715) of the Cariplo Foundation. The authors thank Dr. Luca Lamagna from MDM for depositing the Al2O3 layers and Dr. Yannick Anguy from I2M for the ESEM measurements.
High Temperature Thermal Conductivity of Amorphous Al2O3 Thin Films Grown by Low Temperature ALD†
Article first published online: 6 AUG 2013
© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Engineering Materials
Volume 15, Issue 11, pages 1046–1050, November 2013
How to Cite
Cappella, A., Battaglia, J.-L., Schick, V., Kusiak, A., Lamperti, A., Wiemer, C. and Hay, B. (2013), High Temperature Thermal Conductivity of Amorphous Al2O3 Thin Films Grown by Low Temperature ALD. Adv. Eng. Mater., 15: 1046–1050. doi: 10.1002/adem.201300132
- Issue published online: 4 NOV 2013
- Article first published online: 6 AUG 2013
- Manuscript Accepted: 14 JUN 2013
- Manuscript Received: 12 APR 2013
- Laboratoire National de Métrologie at d'Essais
- European Union on the basis of Decision No. 912/2009/EC
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