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Fabrication and Characterization of Stable Ultrathin Film Micropatterns Containing CdS Nanoparticles


  • The authors are grateful to the National Natural Science Foundation (Grant No. 39 870 227 and 50 002) and the Major State Basic Research Development Program of China (Grant No. G2 000 077 503) for their financial support of this work.


Stable, ultrathin micropatterns containing CdS nanoparticles (CdS-NPs) were fabricated in a two-step process. In the first step, a precursor film was built-up by the layer-by-layer electrostatic self-assembly of photosensitive nitro-diazoresin and mercaptoacetic acid capped CdS nanoparticles. In the second step, the film was selectively exposed to UV light through a photomask and developed in an aqueous solution of sodium dodecylsulfate (SDS). The formation of covalently linked micropatterns was based on the different solubilities of the irradiated and non-irradiated parts of the film in the developer. Namely, the irradiated regions were cross-linked and insoluble, whereas the non-irradiated regions, linked with ionic bonds, were removed by the SDS solution. The resultant patterns were systematically characterized with atomic force microscopy, field emission scanning electron microscopy, optical microscopy, and X-ray photoelectron spectroscopy.

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