This work has been supported by the Autonomous Government of Madrid under Project CAM 07 N/0086/2002.
Multilayer Microwires: Tailoring Magnetic Behavior by Sputtering and Electroplating †
Article first published online: 10 MAR 2004
Copyright © 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Functional Materials
Volume 14, Issue 3, pages 266–268, March, 2004
How to Cite
Pirota, K., Hernández-Vélez, M., Navas, D., Zhukov, A. and Vázquez, M. (2004), Multilayer Microwires: Tailoring Magnetic Behavior by Sputtering and Electroplating . Adv. Funct. Mater., 14: 266–268. doi: 10.1002/adfm.200304432
- Issue published online: 10 MAR 2004
- Article first published online: 10 MAR 2004
- Manuscript Accepted: 15 OCT 2003
- Manuscript Received: 18 JUN 2003
- Magnetic materials;
- Magnetic properties;
A novel technique for preparing multilayer microwires with controlled magnetic behavior has been developed. This technique involves combining sputtering and electroplating procedures to deposit (magnetic or non-magnetic) metallic nano- and microlayers onto glass-coated amorphous magnetic microwires. A suitable choice of magnetostrictive amorphous metallic nucleus, together with the specific stresses induced by the deposited layers, allows the tailoring of specific magnetic behavior. In this way, the preparation of multilayer microwires characterized either by square-shaped hysteretic loops (typical of magnetically bistable microwires with longitudinal easy axes), or by nearly non-hysteretic loops (for those microwires with a circumferential magnetization easy axes), can be achieved.