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Self-Assembled Monolayer Coatings on Nanostencils for the Reduction of Materials Adhesion†

  1. M. Kölbel1,
  2. R.W. Tjerkstra2,
  3. G. Kim3,
  4. J. Brugger3,5,
  5. C.J.M. van Rijn4,
  6. W. Nijdam4,
  7. J. Huskens,
  8. D.N. Reinhoudt

Article first published online: 7 MAR 2003

DOI: 10.1002/adfm.200390033

Issue

Advanced Functional Materials

Advanced Functional Materials

Volume 13, Issue 3, pages 219–224, March, 2003

Additional Information

How to Cite

Kölbel, M., Tjerkstra, R.W., Kim, G., Brugger, J., van Rijn, C.J.M., Nijdam, W., Huskens, J. and Reinhoudt, D.N. (2003), Self-Assembled Monolayer Coatings on Nanostencils for the Reduction of Materials Adhesion. Adv. Funct. Mater., 13: 219–224. doi: 10.1002/adfm.200390033

Author Information

  1. 1

    Laboratory of Supramolecular Chemistry and Technology, MESA+ Research Institute, University of Twente, PO Box 217, NL-7500 AE Enschede, The Netherlands

  2. 2

    Transduction Technology Group, MESA+ Research Institute, University of Twente, PO Box 217, NL-7500 AE Enschede, The Netherlands

  3. 3

    NanoLink, MESA+ Research Institute, University of Twente, PO Box 217, NL-7500 AE Enschede, The Netherlands

  4. 4

    Aquamarijn Micro Filtration B.V., Beatrixlaan 2, NL-7255 DB Hengelo Gld., The Netherlands

  5. 5

    Present address: Microsystems Laboratory, École Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland

  1. †

    We thank Mark A. Smithers for SEM images, Albert van den Berg for XPS measurements and Frans Segerink for FIB experiments. The work was supported by the ATOMS project of the EU.

Publication History

  1. Issue published online: 7 MAR 2003
  2. Article first published online: 7 MAR 2003
  3. Manuscript Accepted: 6 SEP 2002
  4. Manuscript Received: 6 MAY 2002

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Keywords:

  • Coatings;
  • Nanostencils;
  • Self-assembled monolayers;
  • Silicon nitrides

Abstract

Nanostencils (shadow masks with submicrometer apertures in a thin silicon nitride membrane) are promising tools for the facile one-step generation of nanopatterns of various materials by physical vapor deposition. Evaporation through a shadow mask is accompanied by gradual clogging of the apertures due to adhesion of evaporated material. In order to reduce this effect, nanostencils were coated with alkyl and perfluoroalkyl self-assembled monolayers (SAMs). The formation and properties of SAMs on planar silicon nitride substrates were studied by contact angle goniometry, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). The SAMs are stable under evaporation of gold at various angles. SAM-coated nanostencils showed considerably less adhesion of gold compared to bare SixNy stencils.

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