Patterned Self-Assembled Monolayers on Silicon Oxide Prepared by Nanoimprint Lithography and Their Applications in Nanofabrication

Authors


  • We are grateful for financial support from the Council for Chemical Sciences of the Netherlands Organization for Scientific Research (NWO-CW) (P.M.; Vidi Vernieuwingsimpuls grant 700.52.423 to J.H.), and from the Technology Foundation STW in the Simon Stevin Award program Nanolithography (M.P. and V.M.; grant TST4946 to D.N.R.). We acknowledge Albert van den Berg for the XPS measurements. We thank Prof. Clivia Sotomayor Torres (University of Wuppertal, Germany) for help with the preparation of the e-beam-made stamps, which were obtained within the framework of the EC-funded project NaPa (Contract no. NMP4-CT-2003-500120) for which financial support is gratefully acknowledged. The content of this work is the sole responsibility of the authors.

Abstract

Nanoimprint lithography (NIL) is used as a tool to pattern self-assembled monolayers (SAMs) on silicon substrates because of its ability to pattern in the micrometer and nanometer ranges. The polymer template behaves as a physical barrier preventing the formation of a SAM in the covered areas of the substrate. After polymer removal, SAM patterns are obtained. The versatility of the method is shown in various nanofabrication schemes. Substrates are functionalized with a second type of silane adsorbate. Pattern enhancement via selective electrostatic attachment of carboxylate-functionalized particles is achieved. Further applications of the NIL-patterned substrates include template-directed adsorption of particles, as well as the fabrication of electrodes on top of a SAM.

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