We acknowledge Dr. J. A. Rogers for his technical help and comments, and Dr. H. Cho for helpful comments. This work was partially supported by the Korea Science & Engineering Foundation.
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Full Paper
Pattern-Transfer Fidelity in Soft Lithography: The Role of Pattern Density and Aspect Ratio†
Article first published online: 1 SEP 2005
DOI: 10.1002/adfm.200400295
Copyright © 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
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How to Cite
Lee, T.-W., Mitrofanov, O. and Hsu, J. W. P. (2005), Pattern-Transfer Fidelity in Soft Lithography: The Role of Pattern Density and Aspect Ratio. Adv. Funct. Mater., 15: 1683–1688. doi: 10.1002/adfm.200400295
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Publication History
- Issue published online: 28 SEP 2005
- Article first published online: 1 SEP 2005
- Manuscript Accepted: 31 MAY 2005
- Manuscript Received: 2 JUL 2004
- Abstract
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- Cited By
Keywords:
- Lithography, nano-;
- Molding;
- Nanopatterning;
- Nanostructures;
- Poly(dimethylsiloxane);
- Soft lithography
Abstract
Using high-aspect-ratio nanostructures fabricated via two-photon laser-scanning lithography, we examine the deformation of elastomeric stamps used in soft nanolithography and the fidelity of patterns and replicas made using these stamps. Two-photon laser-scanning lithography enables us to systematically regulate the aspect ratio and pattern density of the nanostructures by varying laser-scanning parameters such as the intensity of the laser beam, the scanning speed, the focal depth inside the resist, and the scanning-line spacing. Two commercially available stamp/mold materials with different moduli have been investigated. We find that the pattern-transfer fidelity is strongly affected by the pattern density. In addition, we demonstrate that true three-dimensional structures can be successfully replicated because of the flexible nature of elastomeric poly(dimethylsiloxane).