Conductive SU8 Photoresist for Microfabrication

Authors


  • This work was supported by the Swiss National Science Foundation.

Abstract

A conductive composite photoresist has been developed for the direct photopatterning of electrodes. It is based on a dispersion of silver nanoparticles in SU8, a non-conductive, negative-tone photoresist. Manufactured structures have an electrical conductivity at a low silver content of around 6 vol.-%.

Ancillary