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Multifaceted and Nanobored Particle Arrays Sculpted Using Colloidal Lithography

Authors


  • This work was supported by the Center for Nanoscale Mechatronics and Manufacturing of the 21st Century Frontier Research Program (M102KN010002-05K1401-00214). Partial support from the National R&D Project for Nano Science and Technology of the Ministry of Commerce, Industry and Energy, the BK21 program, and the CUPS-ERC are also acknowledged. Supporting Information is available online from Wiley InterScience or from the author.

Abstract

A novel method of fabricating multifaceted and nanobored particle arrays via colloidal lithography using colloidal-crystal layers as masks for anisotropic reactive-ion etching (RIE) is reported. The shape of the sculpted particles is dependent on the crystal orientation relative to the etchant flow, the number of colloidal layers, the RIE conditions, and the matrix (or mask) structure in colloidal lithography. Arrays of non-spherical particles with sculpted shapes, which to date could not otherwise be produced, are fabricated using a tilted anisotropic RIE process and the layer-by-layer growth of a colloidal mask. These non-spherical particles and their ordered arrays can be used for antireflection surfaces, biosensors, and nanopatterning masks, as well as non-spherical building blocks for novel colloidal crystals. In addition, polymeric particles with patterned holes of controlled depths obtained by the present method can be applied to the fabrication of functional composite particles.

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