This work was financially supported by the EC-funded Project NOVOPOLY (Contract no. STRP 013619) The authors gratefully acknowledge the EPFL Center for Micro-Nanotechnology (CMI), the EPFL Bioimaging Optical Platform, the CNR IMIP Bari Division, and the CNR IMM Lecce Division. Supporting Information is available online from Wiley InterScience or from the author.
An Epoxy Photoresist Modified by Luminescent Nanocrystals for the Fabrication of 3D High-Aspect-Ratio Microstructures†
Version of Record online: 2 AUG 2007
Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Functional Materials
Volume 17, Issue 13, pages 2009–2017, September, 2007
How to Cite
Ingrosso, C., Fakhfouri, V., Striccoli, M., Agostiano, A., Voigt, A., Gruetzner, G., Curri, M. L. and Brugger, J. (2007), An Epoxy Photoresist Modified by Luminescent Nanocrystals for the Fabrication of 3D High-Aspect-Ratio Microstructures. Adv. Funct. Mater., 17: 2009–2017. doi: 10.1002/adfm.200700098
- Issue online: 23 AUG 2007
- Version of Record online: 2 AUG 2007
- Manuscript Revised: 23 MAR 2007
- Manuscript Received: 23 JAN 2007
- EC-funded Project NOVOPOLY. Grant Number: STRP 013619
Supporting information for this article is available on the WWW under http://www.wiley-vch.de/contents/jc_2126/2007/fp0098_s.pdf or from the author.
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