This work was supported by the National Creative Research Initiative Program by KOSEF. Synchrotron GISAXS measurements at the Pohang Accelerator Laboratory were supported by the Ministry of Science and Technology and the POSCO. Supporting Information is available online from Wiley InterScience or from the authors.
Virus Filtration Membranes Prepared from Nanoporous Block Copolymers with Good Dimensional Stability under High Pressures and Excellent Solvent Resistance†
Article first published online: 17 APR 2008
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Functional Materials
Volume 18, Issue 9, pages 1371–1377, May 9, 2008
How to Cite
Yang, S. Y., Park, J., Yoon, J., Ree, M., Jang, S. K. and Kim, J. K. (2008), Virus Filtration Membranes Prepared from Nanoporous Block Copolymers with Good Dimensional Stability under High Pressures and Excellent Solvent Resistance. Adv. Funct. Mater., 18: 1371–1377. doi: 10.1002/adfm.200700832
- Issue published online: 13 MAY 2008
- Article first published online: 17 APR 2008
- Manuscript Revised: 1 NOV 2007
- Manuscript Received: 25 JUL 2007
- block copolymers;
- nanoporous materials;
- biomedical applications;
We introduce a nanoporous membrane suitable for virus filtration with good dimensional stability under high pressures maintaining high selectivity. The membrane consists of a double layer: The upper layer is a nanoporous film with pore size of ∼17 nm and a thickness of ∼160 nm, which was prepared by polystyrene-block-poly(methyl methacrylate) copolymer (PS-b-PMMA) where PMMA block was removed by ultraviolet irradiation followed by rinsing with acetic acid. The nanoporous block copolymer film was combined with a conventional micro-filtration membrane to enhance mechanical strength. The membrane employed in this study did not show any damage or crack even at a pressure of 2 bar, while high selectivity was maintained for the filtration of human rhinovirus type 14 which has a diameter of ∼30 nm and is a major pathogen of the common cold in humans. Furthermore, due to crosslinked PS matrix during the UV irradiation, the nanoporous membrane showed excellent resistance to all organic solvents. This could be used under harsh filtration conditions such as high temperature and strong acidic (or basic) solution.