Virus Filtration Membranes Prepared from Nanoporous Block Copolymers with Good Dimensional Stability under High Pressures and Excellent Solvent Resistance

Authors

  • Seung Yun Yang,

    1. National Creative Research Initiative Center for Block Copolymer Self-Assembly Department of Environmental Science and Engineering, and Chemical Engineering Pohang University of Science and Technology Kyungbuk 790-784 (Korea)
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  • Jihoon Park,

    1. Departments of Life Sciences, Pohang University of Science and Technology Kyungbuk 790-784 (Korea)
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  • Jinhwan Yoon,

    1. National Research Lab for Polymer Synthesis and Physics Department of Chemistry Pohang University of Science and Technology Kyungbuk 790-784 (Korea)
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  • Moonhor Ree,

    1. National Research Lab for Polymer Synthesis and Physics Department of Chemistry Pohang University of Science and Technology Kyungbuk 790-784 (Korea)
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  • Sung Key Jang,

    1. Departments of Life Sciences, Pohang University of Science and Technology Kyungbuk 790-784 (Korea)
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  • Jin Kon Kim

    Corresponding author
    1. National Creative Research Initiative Center for Block Copolymer Self-Assembly Department of Environmental Science and Engineering, and Chemical Engineering Pohang University of Science and Technology Kyungbuk 790-784 (Korea)
    • National Creative Research Initiative Center for Block Copolymer Self-Assembly Department of Environmental Science and Engineering, and Chemical Engineering Pohang University of Science and Technology Kyungbuk 790-784 (Korea).
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  • This work was supported by the National Creative Research Initiative Program by KOSEF. Synchrotron GISAXS measurements at the Pohang Accelerator Laboratory were supported by the Ministry of Science and Technology and the POSCO. Supporting Information is available online from Wiley InterScience or from the authors.

Abstract

We introduce a nanoporous membrane suitable for virus filtration with good dimensional stability under high pressures maintaining high selectivity. The membrane consists of a double layer: The upper layer is a nanoporous film with pore size of ∼17 nm and a thickness of ∼160 nm, which was prepared by polystyrene-block-poly(methyl methacrylate) copolymer (PS-b-PMMA) where PMMA block was removed by ultraviolet irradiation followed by rinsing with acetic acid. The nanoporous block copolymer film was combined with a conventional micro-filtration membrane to enhance mechanical strength. The membrane employed in this study did not show any damage or crack even at a pressure of 2 bar, while high selectivity was maintained for the filtration of human rhinovirus type 14 which has a diameter of ∼30 nm and is a major pathogen of the common cold in humans. Furthermore, due to crosslinked PS matrix during the UV irradiation, the nanoporous membrane showed excellent resistance to all organic solvents. This could be used under harsh filtration conditions such as high temperature and strong acidic (or basic) solution.

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