Full Paper

Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns†

  1. Yifu Ding,
  2. Hyun Wook Ro,
  3. Kyle J. Alvine,
  4. Brian C. Okerberg,
  5. Jing Zhou,
  6. Jack F. Douglas,
  7. Alamgir Karim,
  8. Christopher L. Soles*

Article first published online: 10 JUN 2008

DOI: 10.1002/adfm.200701402

Issue

Advanced Functional Materials

Advanced Functional Materials

Volume 18, Issue 12, pages 1854–1862, June 24, 2008

Additional Information

How to Cite

Ding, Y., Ro, H. W., Alvine, K. J., Okerberg, B. C., Zhou, J., Douglas, J. F., Karim, A. and Soles, C. L. (2008), Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns. Adv. Funct. Mater., 18: 1854–1862. doi: 10.1002/adfm.200701402

Author Information

  1. Polymers Division, National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899-8541 (USA)

*Polymers Division, National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, Maryland 20899-8541 (USA).

  1. †

    This work is partially funded by the NIST Office of Microelectronic Programs. K. J. Alvine and B. C. Okerberg acknowledge the support of the National Research Council NIST Postdoctoral Fellowship Program. We acknowledge the nanofabrication laboratory of the Center for Nanoscale Science and Technology (CNST) at NIST for providing facilities for the nanoimprint process. This work is an official contribution of the National Institute of Standards and Technology; not subject to copyright in the United States. Certain commercial materials and equipment are identified in this paper in order to specify adequately the experimental procedure. In no case does such identification imply recommendation by the National Institute of Standards and Technology nor does it imply that the material or equipment identified is necessarily the best available for this purpose. The error bars presented throughout this manuscript indicate the relative standard uncertainty of the measurement.

Publication History

  1. Issue published online: 18 JUN 2008
  2. Article first published online: 10 JUN 2008
  3. Manuscript Revised: 29 JAN 2008
  4. Manuscript Received: 30 NOV 2007

Funded by

  • NIST Office of Microelectronic Programs. K. J. Alvine
  • B. C. Okerberg
  • National Research Council NIST Postdoctoral Fellowship Program

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